Coffee-stain growth dynamics on dry and wet surfaces (bibtex)
by , ,
Abstract:
The drying of a drop containing particles often results in the accumulation of the particles at the contact line. In this work, we investigate the drying of an aqueous colloidal drop surrounded by a hydrogel that is also evaporating. We combine theoretical and experimental studies to understand how the surrounding vapor concentration affects the particle deposit during the constant radius evaporation mode. In addition to the common case of evaporation on an otherwise dry surface, we show that in a configuration where liquid is evaporating from a flat surface around the drop, the singularity of the evaporative flux at the contact line is suppressed and the drop evaporation is homogeneous. For both conditions, we derive the velocity field and we establish the temporal evolution of the number of particles accumulated at the contact line. We predict the growth dynamics of the stain and the drying timescales. Thus, dry and wet conditions are compared with experimental results and we highlight that only the dynamics is modified by the evaporation conditions, not the final accumulation at the contact line.
Reference:
F. Boulogne, F. Ingremeau and H. A. Stone, "Coffee-stain growth dynamics on dry and wet surfaces", Journal of Physics: Condensed Matter, vol. 29, no. 7, 2017, pp. 074001.
Bibtex Entry:
@Article{Boulogne2017a,
    author   = {Boulogne, F. and Ingremeau, F. and Stone, H. A.},
    title    = {Coffee-stain growth dynamics on dry and wet surfaces},
    Year     = {2017},
    volume   = {29},
    number   = {7},
    pages    = {074001},
    journal  = {Journal of Physics: Condensed Matter},
    Arxiv    = {1611.07705},
    hal      = {01629947},
    DOI      = {10.1088/1361-648X/aa5160},
    abstract = {The drying of a drop containing particles often results in the accumulation of the particles at the contact line. In this work, we investigate the drying of an aqueous colloidal drop surrounded by a hydrogel that is also evaporating. We combine theoretical and experimental studies to understand how the surrounding vapor concentration affects the particle deposit during the constant radius evaporation mode. In addition to the common case of evaporation on an otherwise dry surface, we show that in a configuration where liquid is evaporating from a flat surface around the drop, the singularity of the evaporative flux at the contact line is suppressed and the drop evaporation is homogeneous. For both conditions, we derive the velocity field and we establish the temporal evolution of the number of particles accumulated at the contact line. We predict the growth dynamics of the stain and the drying timescales. Thus, dry and wet conditions are compared with experimental results and we highlight that only the dynamics is modified by the evaporation conditions, not the final accumulation at the contact line.},
    keywords = {evaporation},
}
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